Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

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Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion. / Ylivaara, Oili M. E.; Liu, Xuwen; Kilpi, L.; Lyytinen, Jussi; Schneider, D.; Laitinen, M.; Julin, J.; Ali, S.; Sintonen, S.; Berdova, Maria; Haimi, Eero; Sajavaara, T.; Ronkainen, H.; Lipsanen, H.; Koskinen, Jari; Hannula, Simo-Pekka; Puurunen, R.L.

In: Thin Solid Films, Vol. 552, 03.02.2014, p. 124-135.

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Ylivaara, Oili M. E. ; Liu, Xuwen ; Kilpi, L. ; Lyytinen, Jussi ; Schneider, D. ; Laitinen, M. ; Julin, J. ; Ali, S. ; Sintonen, S. ; Berdova, Maria ; Haimi, Eero ; Sajavaara, T. ; Ronkainen, H. ; Lipsanen, H. ; Koskinen, Jari ; Hannula, Simo-Pekka ; Puurunen, R.L. / Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion. In: Thin Solid Films. 2014 ; Vol. 552. pp. 124-135.

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@article{3c7bed532b2640b4a93de59360c41f6d,
title = "Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion",
keywords = "adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress, adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress, adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress",
author = "Ylivaara, {Oili M. E.} and Xuwen Liu and L. Kilpi and Jussi Lyytinen and D. Schneider and M. Laitinen and J. Julin and S. Ali and S. Sintonen and Maria Berdova and Eero Haimi and T. Sajavaara and H. Ronkainen and H. Lipsanen and Jari Koskinen and Simo-Pekka Hannula and R.L. Puurunen",
year = "2014",
month = "2",
day = "3",
doi = "10.1016/j.tsf.2013.11.112",
language = "English",
volume = "552",
pages = "124--135",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier Science",

}

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TY - JOUR

T1 - Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

AU - Ylivaara, Oili M. E.

AU - Liu, Xuwen

AU - Kilpi, L.

AU - Lyytinen, Jussi

AU - Schneider, D.

AU - Laitinen, M.

AU - Julin, J.

AU - Ali, S.

AU - Sintonen, S.

AU - Berdova, Maria

AU - Haimi, Eero

AU - Sajavaara, T.

AU - Ronkainen, H.

AU - Lipsanen, H.

AU - Koskinen, Jari

AU - Hannula, Simo-Pekka

AU - Puurunen, R.L.

PY - 2014/2/3

Y1 - 2014/2/3

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

U2 - 10.1016/j.tsf.2013.11.112

DO - 10.1016/j.tsf.2013.11.112

M3 - Article

VL - 552

SP - 124

EP - 135

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -

ID: 806478