Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Research output: Contribution to journalArticleScientificpeer-review

Researchers

Research units

  • VTT Technical Research Centre of Finland
  • Fraunhofer Institute for Material and Beam Technology
  • University of Jyväskylä

Details

Original languageEnglish
Pages (from-to)124-135
Number of pages12
JournalThin Solid Films
Volume552
Publication statusPublished - 3 Feb 2014
MoE publication typeA1 Journal article-refereed

    Research areas

  • adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress

ID: 806478