Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili M. E. Ylivaara; Xuwen Liu; L. Kilpi; Jussi Lyytinen; D. Schneider; Mikko Laitinen; J. Julin; S. Ali; S. Sintonen; Maria Berdova; Eero Haimi; Timo Sajavaara; H. Ronkainen; H. Lipsanen; Jari Koskinen; Simo-Pekka Hannula; R.L. Puurunen

doi:10.1016/j.tsf.2013.11.112

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili M. E. Ylivaara, Xuwen Liu, L. Kilpi, Jussi Lyytinen, D. Schneider, Mikko Laitinen, J. Julin, S. Ali, S. Sintonen, Maria Berdova, Eero Haimi, Timo Sajavaara, H. Ronkainen, H. Lipsanen, Jari Koskinen, Simo-Pekka Hannula, R.L. Puurunen

Research output: Contribution to journal › Article › Scientific › peer-review

168 Citations (Scopus)

Original language	English
Pages (from-to)	124-135
Number of pages	12
Journal	Thin Solid Films
Volume	552
DOIs	https://doi.org/10.1016/j.tsf.2013.11.112
Publication status	Published - 3 Feb 2014
MoE publication type	A1 Journal article-refereed

Keywords

adhesion
aluminum oxide
atomic layer deposition
elastic modulus
hardness
residual stress

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10.1016/j.tsf.2013.11.112

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Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S.-P., & Puurunen, R. L. (2014). Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion. Thin Solid Films, 552, 124-135. https://doi.org/10.1016/j.tsf.2013.11.112

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title = "Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion",

keywords = "adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress, adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress, adhesion, aluminum oxide, atomic layer deposition, elastic modulus, hardness, residual stress",

author = "Ylivaara, \{Oili M. E.\} and Xuwen Liu and L. Kilpi and Jussi Lyytinen and D. Schneider and Mikko Laitinen and J. Julin and S. Ali and S. Sintonen and Maria Berdova and Eero Haimi and Timo Sajavaara and H. Ronkainen and H. Lipsanen and Jari Koskinen and Simo-Pekka Hannula and R.L. Puurunen",

year = "2014",

month = feb,

day = "3",

doi = "10.1016/j.tsf.2013.11.112",

language = "English",

volume = "552",

pages = "124--135",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

Ylivaara, OME, Liu, X, Kilpi, L, Lyytinen, J, Schneider, D, Laitinen, M, Julin, J, Ali, S, Sintonen, S, Berdova, M, Haimi, E, Sajavaara, T, Ronkainen, H, Lipsanen, H , Koskinen, J , Hannula, S-P & Puurunen, RL 2014, 'Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion', Thin Solid Films, vol. 552, pp. 124-135. https://doi.org/10.1016/j.tsf.2013.11.112

TY - JOUR

T1 - Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

AU - Ylivaara, Oili M. E.

AU - Liu, Xuwen

AU - Kilpi, L.

AU - Lyytinen, Jussi

AU - Schneider, D.

AU - Laitinen, Mikko

AU - Julin, J.

AU - Ali, S.

AU - Sintonen, S.

AU - Berdova, Maria

AU - Haimi, Eero

AU - Sajavaara, Timo

AU - Ronkainen, H.

AU - Lipsanen, H.

AU - Koskinen, Jari

AU - Hannula, Simo-Pekka

AU - Puurunen, R.L.

PY - 2014/2/3

Y1 - 2014/2/3

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

KW - adhesion

KW - aluminum oxide

KW - atomic layer deposition

KW - elastic modulus

KW - hardness

KW - residual stress

UR - https://www.scopus.com/pages/publications/84892827806

U2 - 10.1016/j.tsf.2013.11.112

DO - 10.1016/j.tsf.2013.11.112

M3 - Article

SN - 0040-6090

VL - 552

SP - 124

EP - 135

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Keywords

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Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

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