Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili M. E. Ylivaara, Xuwen Liu, L. Kilpi, Jussi Lyytinen, D. Schneider, Mikko Laitinen, J. Julin, S. Ali, S. Sintonen, Maria Berdova, Eero Haimi, Timo Sajavaara, H. Ronkainen, H. Lipsanen, Jari Koskinen, Simo-Pekka Hannula, R.L. Puurunen

Research output: Contribution to journalArticleScientificpeer-review

112 Citations (Scopus)
Original languageEnglish
Pages (from-to)124-135
Number of pages12
JournalThin Solid Films
Publication statusPublished - 3 Feb 2014
MoE publication typeA1 Journal article-refereed


  • adhesion
  • aluminum oxide
  • atomic layer deposition
  • elastic modulus
  • hardness
  • residual stress

Cite this