ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Mikhail Erdmanis; Lasse Karvonen; Rizwan Saleem; Mikko Ruoho; Ville Pale; Ari Tervonen; Seppo Honkanen; Ilkka Tittonen

doi:10.1109/JLT.2012.2200235

ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Mikhail Erdmanis
, Lasse Karvonen
, Rizwan Saleem
, Mikko Ruoho
, Ville Pale
, Ari Tervonen
, Seppo Honkanen
, Ilkka Tittonen

Ilkka Tittonen Group

Research output: Contribution to journal › Article › Scientific › peer-review

16 Citations (Scopus)

Abstract

We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO₂ layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

Original language	English
Pages (from-to)	2488-2493
Journal	Journal of Lightwave Technology
Volume	30
Issue number	15
DOIs	https://doi.org/10.1109/JLT.2012.2200235
Publication status	Published - 2012
MoE publication type	A1 Journal article-refereed

Keywords

Chromatic dispersion, coatings, optical waveguides,
silicon-on-insulator (SOI) technology, thin films

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10.1109/JLT.2012.2200235

Cite this

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abstract = " We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances. ",

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author = "Mikhail Erdmanis and Lasse Karvonen and Rizwan Saleem and Mikko Ruoho and Ville Pale and Ari Tervonen and Seppo Honkanen and Ilkka Tittonen",

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T1 - ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

AU - Erdmanis, Mikhail

AU - Karvonen, Lasse

AU - Saleem, Rizwan

AU - Ruoho, Mikko

AU - Pale, Ville

AU - Tervonen, Ari

AU - Honkanen, Seppo

AU - Tittonen, Ilkka

N1 - VK: Academy of Finland projects 129043 and 13251210

PY - 2012

Y1 - 2012

N2 - We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

AB - We propose a new technique for the multiorder dispersion engineering of nanophotonic strip waveguides. Unlike other techniques, the method does not require wafers with customized parameters and is fully compatible with standard wafers used in nanophotonics. The dispersion management is based on the application of nanometer-thick TiO2 layer formed by atomic layer deposition. The method is simple and reliable and allows good control of dispersion up to the fourth-order terms. The additional advantages are the reduction of propagation losses and partial compensation of fabrication tolerances.

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

KW - Chromatic dispersion, coatings, optical waveguides,

KW - silicon-on-insulator (SOI) technology, thin films

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DO - 10.1109/JLT.2012.2200235

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EP - 2493

JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 15

ER -

ALD-assisted multi-order dispersion engineering of nanophotonic strip waveguides

Abstract

Keywords

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