Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhen Zhu, Saoussen Merdes, Oili M. E. Ylivaara, Kenichiro Mizohata, Mikko J. Heikkila, Hele Savin

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3 Citations (Scopus)

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