Aggregation Kinetics of Thermal Double Donors in Silicon

Y.-J. Lee, Juhani von Boehm, M. Pesola, R.M. Nieminen

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Abstract

A general kinetic model based on accurate density-functional-theoretic total-energy calculations is introduced to describe the aggregation kinetics of oxygen-related thermal double donors (TDD's) in silicon. The calculated kinetics, which incorporates the reactions of associations, dissociations, and isomerizations of all relevant oxygen complexes, is in agreement with experimental annealing studies. The aggregation of TDD's takes place through parallel-consecutive reactions where both mobile oxygen dimers and fast migrating chainlike TDD's capture interstitial oxygen atoms.
Original languageEnglish
Pages (from-to)3060-3063
JournalPhysical Review Letters
Volume86
Issue number14
DOIs
Publication statusPublished - 2001
MoE publication typeA1 Journal article-refereed

Keywords

  • Thermal Double Donors

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