Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectris

Lauri Niinistö; Minna Nieminen; Jaakko Niinistö; Matti Putkonen; Jani Päiväsaari

Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectris

Lauri Niinistö, Minna Nieminen, Jaakko Niinistö, Matti Putkonen, Jani Päiväsaari

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	E-MRS 2003 Fall Meeting, Varsova, Puola
Place of Publication	Varsova, Puola
Publisher	European Materials Research Society
Pages	61
Publication status	Published - 2003
MoE publication type	A4 Article in a conference publication

Keywords

ALD
atomic layer deposition
high-k dielectrics
thin films

Cite this

Niinistö, Lauri ; Nieminen, Minna ; Niinistö, Jaakko ; Putkonen, Matti ; Päiväsaari, Jani. / Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectris. E-MRS 2003 Fall Meeting, Varsova, Puola. Varsova, Puola : European Materials Research Society, 2003. pp. 61

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author = "Lauri Niinist{\"o} and Minna Nieminen and Jaakko Niinist{\"o} and Matti Putkonen and Jani P{\"a}iv{\"a}saari",

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Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectris. / Niinistö, Lauri; Nieminen, Minna; Niinistö, Jaakko; Putkonen, Matti; Päiväsaari, Jani.

E-MRS 2003 Fall Meeting, Varsova, Puola. Varsova, Puola : European Materials Research Society, 2003. p. 61.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectris

AU - Niinistö, Lauri

AU - Nieminen, Minna

AU - Niinistö, Jaakko

AU - Putkonen, Matti

AU - Päiväsaari, Jani

PY - 2003

Y1 - 2003

KW - ALD

KW - atomic layer deposition

KW - high-k dielectrics

KW - thin films

KW - ALD

KW - atomic layer deposition

KW - high-k dielectrics

KW - thin films

KW - ALD

KW - atomic layer deposition

KW - high-k dielectrics

KW - thin films

M3 - Conference contribution

SP - 61

BT - E-MRS 2003 Fall Meeting, Varsova, Puola

PB - European Materials Research Society

CY - Varsova, Puola

ER -