Adsorption of metal impurities on H-terminated Si surfaces and their influence on the wet chemical etching of Si

Teemu Hynninen, Adam S. Foster, Miguel A. Gosálvez, Kazuo Sato, Risto M. Nieminen

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)
Original languageEnglish
Article number485005
Number of pages9
JournalJournal of physics: Condensed matter
Volume20
Issue number48
DOIs
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

Keywords

  • adsorption
  • clusters
  • etching
  • metal impurities
  • surface morphology

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