A comparative study on lanthanide oxide thin films grown by atomic layer deposition

Research output: Contribution to journalArticleScientificpeer-review

Researchers

  • Jani Päiväsaari
  • Matti Putkonen
  • Lauri Niinistö

Research units

Details

Original languageEnglish
Pages (from-to)275-281
JournalThin Solid Films
Volume472
Issue number1-2
Publication statusPublished - 2005
MoE publication typeA1 Journal article-refereed

    Research areas

  • ALD, atomic layer deposition, electrical measurements, electrical properties, lanthanides, oxides

ID: 2377319