A comparative study on lanthanide oxide thin films grown by atomic layer deposition

Jani Päiväsaari, Matti Putkonen, Lauri Niinistö

    Research output: Contribution to journalArticleScientificpeer-review

    138 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)275-281
    JournalThin Solid Films
    Volume472
    Issue number1-2
    Publication statusPublished - 2005
    MoE publication typeA1 Journal article-refereed

    Keywords

    • ALD
    • atomic layer deposition
    • electrical measurements
    • electrical properties
    • lanthanides
    • oxides

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