Applications of Atomics Layer Deposition in Silicon Nanophotonics

The project deals with investigation of thin film materials fabricated with atomic layer deposition (ALD) for applications in silicon nanophotonics. It has a strong focus on interaction of light with optical materials exhibiting large third-order nonlinearities, which can be used in all-optical signal processing applications for optical telecommunications. The main emphasis is put on slot nanowaveguides and devices based on them. This multidisciplinary project will strengthen the collaboration between research teams in Finland. Extensive international collaboration is an important part of the project.