JVST A Best ALD Paper Award

Österlund, Elmeri (Recipient), Seppänen, Heli (Recipient), Bespalova, Kristina (Recipient), Miikkulainen, Ville (Recipient) & Paulasto-Kröckel, Mervi (Recipient)

Department of Chemistry and Materials Science
Electronics Integration and Reliability
School of Electrical Engineering
Department of Electrical Engineering and Automation
Harri Lipsanen Group
Department of Electronics and Nanoengineering

Prize: Award or honor granted for a specific work

Description

Award for paper "Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls, by Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen and Mervi Paulasto-Kröckel, JVST A 39, 032403 (2021)"

Awarded date	28 Jun 2021
Degree of recognition	International
Granting Organisations	American Vacuum Society

Awarded at event

Event title	International Conference on Atomic Layer Deposition
Location	virtual in 2021 (because of Covid-19), Virtual, OnlineShow on map
Period	27 Jun 2021 → 30 Jun 2021

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Documents & Links

https://ald2021.avs.org/awards/