Description

Award for paper "Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls, by Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen and Mervi Paulasto-Kröckel, JVST A 39, 032403 (2021)"
Degree of recognitionInternational
Granting OrganisationsAmerican Vacuum Society

Awarded at event

Event titleInternational Conference on Atomic Layer Deposition
Locationvirtual in 2021 (because of Covid-19), Virtual, Online
Period27 Jun 2021 → 30 Jun 2021

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