Riikka Puurunen

20002020

Research output per year

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Research Output

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Review Article
Review Article

A short history of atomic layer deposition: Tuomo Suntola's atomic layer epitaxy

Puurunen, R. L., 1 Dec 2014, In : Chemical Vapor Deposition. 20, 10-12, p. 332-344 13 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
81 Citations (Scopus)

Conformality in atomic layer deposition: Current status overview of analysis and modelling

Cremers, V., Puurunen, R. L. & Dendooven, J., 1 Jun 2019, In : APPLIED PHYSICS REVIEWS. 6, 2, 021302.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
File
49 Citations (Scopus)
159 Downloads (Pure)

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Miikkulainen, V., Leskelä, M., Ritala, M. & Puurunen, R. L., 14 Jan 2013, In : Journal of Applied Physics. 113, 2, 021301.

Research output: Contribution to journalReview ArticleScientificpeer-review

830 Citations (Scopus)

Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides: A review

Puurunen, R. L., Feb 2005, In : Chemical Vapor Deposition. 11, 2, p. 79-90 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

61 Citations (Scopus)

Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., Kanervo, J. & 42 others, Khmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kärkkänen, I., Kääriäinen, M. L., Kääriäinen, T., Lamagna, L., Łapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Törndahl, T., Van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 010801.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
File
34 Citations (Scopus)
916 Downloads (Pure)

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Puurunen, R. L., 2005, In : Journal of Applied Physics. 97, 12, p. 1-52 121301.

Research output: Contribution to journalReview ArticleScientificpeer-review

1833 Citations (Scopus)