Riikka Puurunen

20002020

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2020

Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Arts, K., Deijkers, J. H., Faraz, T., Puurunen, R., Kessels, W. M. M. E. & Knoops, H. C. M., 22 Jul 2020, In : Applied Physics Letters. 117, 031602.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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30 Downloads (Pure)
Open Access

Hydrodeoxygenation of levulinic acid dimers on a zirconia-supported ruthenium catalyst

Mäkelä, E., Escobedo, J. L. G., Lindblad, M., Käldström, M., Meriö-Talvio, H., Jiang, H., Puurunen, R. L. & Karinen, R., 1 Feb 2020, In : CATALYSTS. 10, 2, 200.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
38 Downloads (Pure)
Open Access
1 Citation (Scopus)

Liquid-phase Hydrodeoxygenation of 4-Propylphenol to Propylbenzene : Reducible Supports for Pt Catalysts

Mäkelä, E., González Escobedo, J. L., Neuvonen, J., Lahtinen, J., Lindblad, M., Lassi, U., Karinen, R. & Puurunen, R. L., 20 May 2020, In : ChemCatChem.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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11 Downloads (Pure)
2019

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

Arts, K., Utriainen, M., Puurunen, R. L., Kessels, W. M. M. & Knoops, H. C. M., 7 Nov 2019, In : Journal of Physical Chemistry C. 123, 44, p. 27030-27035 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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6 Citations (Scopus)
38 Downloads (Pure)

Kinetic modelling of the aqueous-phase reforming of fischer-tropsch water over ceria-zirconia supported nickel-copper catalyst

Coronado, I., Arandia, A., Reinikainen, M., Karinen, R., Puurunen, R. L. & Lehtonen, J., 1 Nov 2019, In : CATALYSTS. 9, 11, 936.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
2 Citations (Scopus)
38 Downloads (Pure)

Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study

Voigt, P., Haimi, E., Lahtinen, J., Cheah, Y. W., Mäkelä, E., Viinikainen, T. & Puurunen, R. L., Aug 2019, In : Topics in Catalysis. 7–11, p. 611–620

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
1 Citation (Scopus)
36 Downloads (Pure)

Solvent-free Hydrodeoxygenation of γ-Nonalactone on Noble Metal Catalysts Supported on Zirconia

González Escobedo, J. L., Mäkelä, E., Braunschweiler, A., Lehtonen, J., Lindblad, M., Puurunen, R. L. & Karinen, R., 1 Jan 2019, In : Topics in Catalysis.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
2 Citations (Scopus)
132 Downloads (Pure)

Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

Arts, K., Vandalon, V., Puurunen, R. L., Utriainen, M., Gao, F., Erwin Kessels, W. M. M. & Knoops, H. C. M., 24 Apr 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 3, 5 p., 030908.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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6 Citations (Scopus)
27 Downloads (Pure)

ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

Kia, A. M., Haufe, N., Esmaeili, S., Mart, C., Utriainen, M., Puurunen, R. L. & Weinreich, W., Jul 2019, In : Nanomaterials. 9, 7, 14 p., 1035.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
7 Citations (Scopus)
156 Downloads (Pure)
2018

Aqueous-phase reforming of Fischer-Tropsch alcohols over nickel-based catalysts to produce hydrogen: Product distribution and reaction pathways

Coronado, I., Pitínová, M., Karinen, R., Reinikainen, M., Puurunen, R. L. & Lehtonen, J., 25 Oct 2018, In : Applied Catalysis A: General. 567, p. 112-121 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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10 Citations (Scopus)
54 Downloads (Pure)

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Sippola, P., Pyymaki Perros, A., Ylivaara, O. M. E., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 1 Sep 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 051508.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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2 Citations (Scopus)
91 Downloads (Pure)

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
13 Citations (Scopus)
173 Downloads (Pure)
Open Access
File
4 Citations (Scopus)
17 Downloads (Pure)

Study of Ni, Pt, and Ru Catalysts on Wood-based Activated Carbon Supports and their Activity in Furfural Conversion to 2-Methylfuran

Mäkelä, E., Lahti, R., Jaatinen, S., Romar, H., Hu, T., Puurunen, R. L., Lassi, U. & Karinen, R., 2018, In : ChemCatChem. 10, 15, p. 3269-3283

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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11 Citations (Scopus)
115 Downloads (Pure)

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M., Sajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 13 p., 01A122.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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4 Citations (Scopus)
149 Downloads (Pure)
2017

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S. P., Ronkainen, H. & Puurunen, R., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 01B105.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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14 Citations (Scopus)
245 Downloads (Pure)
2016

Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 1 Jan 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 1, p. 1-11 11 p., 01A124.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
14 Citations (Scopus)
120 Downloads (Pure)

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Mattinen, M., Hämäläinen, J., Gao, F., Jalkanen, P., Mizohata, K., Räisänen, J., Puurunen, R. L., Ritala, M. & Leskelä, M., 18 Oct 2016, In : Langmuir. 32, 41, p. 10559-10569 11 p.

Research output: Contribution to journalArticleScientificpeer-review

14 Citations (Scopus)

Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition

Ali, S., Juntunen, T., Sintonen, S., Ylivaara, O. M. E., Puurunen, R., Lipsanen, H., Tittonen, I. & Hannula, S. P., 27 Sep 2016, In : Nanotechnology. 27, 44, 445704.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)
2015

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Berdova, M., Ylivaara, O. M. E., Rontu, V., Törmä, P. T., Puurunen, R. & Franssila, S., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
9 Citations (Scopus)
341 Downloads (Pure)

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Gao, F., Arpiainen, S. & Puurunen, R. L., 1 Jan 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 010601.

Research output: Contribution to journalArticleScientificpeer-review

27 Citations (Scopus)
2014

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S-P. & Puurunen, R. L., 3 Feb 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journalArticleScientificpeer-review

97 Citations (Scopus)

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Liu, X., Haimi, E., Hannula, S-P., Ylivaara, O. M. E. & Puurunen, R. L., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-6 6 p., 01A116.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
4 Citations (Scopus)
145 Downloads (Pure)

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X., Haimi, E., Hannula, S-P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2 May 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

Research output: Contribution to journalArticleScientificpeer-review

37 Citations (Scopus)

X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-4 4 p., 01A111.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
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17 Citations (Scopus)
22 Downloads (Pure)
2012

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

Puurunen, R. L., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 240-245 6 p.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

Research output: Contribution to journalArticleScientificpeer-review

14 Citations (Scopus)
2011

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

Puurunen, R. L., Sajavaara, T., Santala, E., Miikkulainen, V., Saukkonen, T., Laitinen, M. & Leskelä, M., 2011, In : Journal of Nanoscience and Nanotechnology. 11, 9, p. 8101-8107

Research output: Contribution to journalArticleScientificpeer-review

33 Citations (Scopus)

Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

Laitinen, M., Sajavaara, T., Rossi, M., Julin, J., Puurunen, R. L., Suni, T., Ishida, T., Fujita, H., Arstila, K., Brijs, B. & Whitlow, H. J., 15 Dec 2011, In : NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 269, 24, p. 3021-3024 4 p.

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)
2010

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

Laamanen, M., Blomberg, M., Puurunen, R. L., Miranto, A. & Kattelus, H., Aug 2010, In : Sensors and Actuators A: Physical. 162, 2, p. 210-214 5 p.

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)
2007

Atomic layer deposition of iridium(III) acetylacetonate on alumina, silica-alumina, and silica supports

Silvennoinen, R., Jylhä, O., Lindblad, M., Sainio, J., Puurunen, R. & Krause, O., 2007, In : Applied Surface Science. 253, 9, p. 4103-4111

Research output: Contribution to journalArticleScientificpeer-review

27 Citations (Scopus)
2006

Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition

Dekker, J., Kolari, K. & Puurunen, R. L., 2006, In : Journal of Vacuum Science and Technology. Part B.. 24, 5, p. 2350-2355 6 p.

Research output: Contribution to journalArticleScientificpeer-review

36 Citations (Scopus)

Nucleation of atomic-layer-deposited HfO 2 films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation

Green, M. L., Allen, A. J., Li, X., Wang, J., Ilavsky, J., Delabie, A., Puurunen, R. L. & Brijs, B., 2006, In : Applied Physics Letters. 88, 3, p. 1-3 3 p., 032907.

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)
2005

Atomic layer deposition of hafnium oxide on germanium substrates

Delabie, A., Puurunen, R. L., Brijs, B., Caymax, M., Conard, T., Onsia, B., Richard, O., Vandervorst, W., Zhao, C., Heyns, M. M., Meuris, M., Viitanen, M. M., Brongersma, H. H., De Ridder, M., Goncharova, L. V., Garfunkel, E., Gustafsson, T. & Tsai, W., 2005, In : Journal of Applied Physics. 97, 6, 064104.

Research output: Contribution to journalArticleScientificpeer-review

93 Citations (Scopus)
65 Citations (Scopus)

Grazing incidence-X-ray fluorescence spectrometry for the compositional analysis of nanometer-thin high-κ dielectric HfO2 layers

Hellin, D., Delabie, A., Puurunen, R. L., Beaven, P., Conard, T., Brijs, B., De Gendt, S. & Vinckier, C., Jul 2005, In : ANALYTICAL SCIENCES. 21, 7, p. 845-850 6 p.

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)

Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films

Puurunen, R. L., Delabie, A., Van Elshocht, S., Caymax, M., Green, M. L., Brijs, B., Richard, O., Bender, H., Conard, T., Hoflijk, I., Vandervorst, W., Hellin, D., Vanhaeren, D., Zhao, C., De Gendt, S. & Heyns, M., 14 Feb 2005, In : Applied Physics Letters. 86, 7, p. 1-3 3 p., 073116.

Research output: Contribution to journalArticleScientificpeer-review

28 Citations (Scopus)

The future of high-K on pure germanium and its importance for Ge CMOS

Meuris, M., Delabie, A., Van Elshocht, S., Kubicek, S., Verheyen, P., De Jaeger, B., Van Steenbergen, J., Winderickx, G., Van Moorhem, E., Puurunen, R. L., Brijs, B., Caymax, M., Conard, T., Richard, O., Vandervorst, W., Zhao, C., De Gendt, S., Schram, T., Chiarella, T., Onsia, B. & 7 others, Teerlinck, I., Houssa, M., Mertens, P. W., Raskin, G., Mijlemans, P., Biesemans, S. & Heyns, M. M., Feb 2005, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 8, 1-3, p. 203-207 5 p.

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)
2004

Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water

Puurunen, R. L., 1 May 2004, In : Journal of Applied Physics. 95, 9, p. 4777-4786 10 p.

Research output: Contribution to journalArticleScientificpeer-review

76 Citations (Scopus)

Island growth as a growth mode in atomic layer deposition: A phenomenological model

Puurunen, R. L. & Vandervorst, W., 15 Dec 2004, In : Journal of Applied Physics. 96, 12, p. 7686-7695 10 p., 10.

Research output: Contribution to journalArticleScientificpeer-review

213 Citations (Scopus)

Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy

Puurunen, R. L., Vandervorst, W., Besling, W. F. A., Richard, O., Bender, H., Conard, T., Zhao, C., Delabie, A., Caymax, M., De Gendt, S., Heyns, M., Viitanen, M. M., De Ridder, M., Brongersma, H. H., Tamminga, Y., Dao, T., De Win, T., Verheijen, M., Kaiser, M. & Tuominen, M., 1 Nov 2004, In : Journal of Applied Physics. 96, 9, p. 4878-4889 12 p.

Research output: Contribution to journalArticleScientificpeer-review

113 Citations (Scopus)

Random deposition as a growth mode in atomic layer deposition

Puurunen, R. L., Jun 2004, In : Chemical Vapor Deposition. 10, 3, p. 159-170 12 p.

Research output: Contribution to journalArticleScientificpeer-review

47 Citations (Scopus)
2003

Chromium(III) supported on aluminum-nitride-surfaced alumina: characteristics and dehydrogenation activity

Puurunen, R., Airaksinen, S. & Krause, O., 2003, In : Journal of Catalysis. 213, p. 281-290

Research output: Contribution to journalArticleScientificpeer-review

21 Citations (Scopus)

Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model

Puurunen, R., 2003, In : Chemical Vapor Deposition. 9, 5, p. 249-257

Research output: Contribution to journalArticleScientificpeer-review

132 Citations (Scopus)

Growth Per Cycle in Atomic Layer Deposition: Real Application Examples of a Theoretical Model

Puurunen, R., 2003, In : Chemical Vapor Deposition. 9, 6, p. 327-332

Research output: Contribution to journalArticleScientificpeer-review

77 Citations (Scopus)
2002

Cobalt(III)acetylacetonate chemisorbed on aluminum-nitride-modified silica: characteristics and hydroformylation activity

Puurunen, R., Zeelie, T. & Krause, O., 2002, In : Catalysis Letters. 83, 1-2, p. 27-32

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)

Growth of Aluminum Nitride on Porous Alumina and Silica through Separate Saturated Gas-Solid Reactions of Trimethylaluminum and Ammonia

Puurunen, R., Root, A., Sarv, P., Viitanen, M., Brongersma, H., Lindblad, M. & Krause, O., 2002, In : Chemistry of Materials. 14, p. 720-729

Research output: Contribution to journalArticleScientificpeer-review

31 Citations (Scopus)

Preparation of silica-supported cobalt catalysts through chemisorption of cobalt(II) and cobalt(III) acetylacetonate

Rautiainen, A., Lindblad, M., Backman, L. & Puurunen, R., 2002, In : Physical Chemistry Chemical Physics. 4, p. 2466-2472

Research output: Contribution to journalArticleScientificpeer-review

39 Citations (Scopus)