Riikka Puurunen

20002020

Research output per year

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Research Output

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Conference contribution
2018

Learnings from an open science effort: Virtual project on the history of ALD

Puurunen, R. L., 1 Jan 2018, ATOMIC LAYER DEPOSITION APPLICATIONS. De Gendt, S., Elam, J. W., Dendooven, J., Van Der Straten, O., Roozeboom, F., Liu, C. & Illiberi, A. (eds.). Electrochemical Society, Inc., Vol. 14. p. 3-17 15 p. (ECS Transactions; vol. 86, no. 6).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

1 Citation (Scopus)
2017

Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures

Puurunen, R. L. & Gao, F., 24 Mar 2017, 2016 14th International Baltic Conference on Atomic Layer Deposition, BALD 2016 - Proceedings. IEEE, p. 20-24 5 p. 7886526

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

9 Citations (Scopus)
2012

Use of ALD thin film bragg mirror stacks in tuneable visible light mems fabry-perot interferometers

Rissanen, A. & Puurunen, R. L., 2012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V. Vol. 8249. 82491A

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

8 Citations (Scopus)
2011

Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

Puurunen, R. L., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 2011, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. p. 978-981 4 p. 5969474

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

5 Citations (Scopus)
2010

Bonding of ALD alumina for advanced SOI substrates

Suni, T., Puurunen, R. L., Ylivaara, O., Kattelus, H., Henttinen, K., Ishida, T. & Fujita, H., 2010, Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gosele. 4 ed. Vol. 33. p. 137-144 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

7 Citations (Scopus)

Vapor-phase self-assembled monolayers for improved MEMS reliability

Rissanen, A., Tappura, K., Laamanen, M., Puurunen, R., Färm, E., Ritala, M. & Leskelä, M., 2010, IEEE Sensors 2010 Conference, SENSORS 2010. p. 767-770 4 p. 5690769

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

4 Citations (Scopus)
2007

Implementing ALD layers in MEMS processing

Puurunen, R. L., Saarilahti, J. & Kattelus, H., 2007, ECS Transactions - 3rd Symposium on Atomic Layer Deposition Applications. 7 ed. Vol. 11. p. 3-14 12 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

64 Citations (Scopus)
2005

Surface preparation techniques for high-k deposition on Ge substrates

Van Elshocht, S., Delabie, A., Brijs, B., Caymax, M., Conard, T., Onsia, B., Puurunen, R., Richard, O., Van Steenbergen, J., Zhao, C., Meuris, M. & Heyns, M. M., 2005, Ultra Clean Processing of Silicon Surfaces VII, UCPSS 2004 - Proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS). Trans Tech Publications Ltd., Vol. 103-104. p. 31-34 4 p. (Solid State Phenomena; vol. 103-104).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

4 Citations (Scopus)
2003

Implementation of high-k gate dielectrics - A status update

De Gendt, S., Chen, J., Carter, R., Cartier, E., Caymax, M., Claes, M., Conard, T., Delabie, A., Deweerd, W., Kaushik, V., Kerber, A., Kubicek, S., Maes, J. W., Niwa, M., Pantisano, L., Puurunen, R., Ragnarsson, L., Schram, T., Shimamoto, Y., Tsai, W. & 6 others, Rohr, E., Van Elshocht, S., Witters, T., Young, E., Zhao, C. & Heyns, M., 2003, Extended Abstracts of International Workshop on Gate Insulator, IWGI 2003. IEEE, p. 10-14 5 p. 1252497

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

1 Citation (Scopus)

Scaling of Hf-based gate dielectrics - Integration with polysilicon gates

De Gendt, S., Caymax, M., Chen, J., Claes, M., Conard, T., Delabie, A., Deweerd, W., Kaushik, V., Kerber, A., Kubicek, S., Niwa, M., Pantisano, L., Puurunen, R., Ragnarsson, L., Schram, T., Shimamoto, Y., Tsai, W., Rohr, E., Van Elshocht, S., Vandervorst, W. & 4 others, Witters, T., Young, E., Zhao, C. & Heyns, M., 2003, Physics and Technology of High-k Gate Dielectrics II : proceedings of the Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : held in Orlando, Florida, October 12-16, 2003 . Kar, S., Misra, D., Houssa, M., Landheer, D. & et al, A. (eds.). p. 267-275 9 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review