Riikka Puurunen

20002020

Research output per year

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Research Output

2020
Open Access

Hydrodeoxygenation of levulinic acid dimers on a zirconia-supported ruthenium catalyst

Mäkelä, E., Escobedo, J. L. G., Lindblad, M., Käldström, M., Meriö-Talvio, H., Jiang, H., Puurunen, R. L. & Karinen, R., 1 Feb 2020, In : CATALYSTS. 10, 2, 200.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
29 Downloads (Pure)
Open Access
1 Citation (Scopus)
2019

Conformality in atomic layer deposition: Current status overview of analysis and modelling

Cremers, V., Puurunen, R. L. & Dendooven, J., 1 Jun 2019, In : APPLIED PHYSICS REVIEWS. 6, 2, 021302.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
File
40 Citations (Scopus)
154 Downloads (Pure)

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

Arts, K., Utriainen, M., Puurunen, R. L., Kessels, W. M. M. & Knoops, H. C. M., 7 Nov 2019, In : Journal of Physical Chemistry C. 123, 44, p. 27030-27035 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
2 Citations (Scopus)
31 Downloads (Pure)

Kinetic modelling of the aqueous-phase reforming of fischer-tropsch water over ceria-zirconia supported nickel-copper catalyst

Coronado, I., Arandia, A., Reinikainen, M., Karinen, R., Puurunen, R. L. & Lehtonen, J., 1 Nov 2019, In : CATALYSTS. 9, 11, 936.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
2 Citations (Scopus)
25 Downloads (Pure)

Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study

Voigt, P., Haimi, E., Lahtinen, J., Cheah, Y. W., Mäkelä, E., Viinikainen, T. & Puurunen, R. L., Aug 2019, In : Topics in Catalysis. 7–11, p. 611–620

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
1 Citation (Scopus)
32 Downloads (Pure)

Solvent-free Hydrodeoxygenation of γ-Nonalactone on Noble Metal Catalysts Supported on Zirconia

González Escobedo, J. L., Mäkelä, E., Braunschweiler, A., Lehtonen, J., Lindblad, M., Puurunen, R. L. & Karinen, R., 1 Jan 2019, In : Topics in Catalysis.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
2 Citations (Scopus)
125 Downloads (Pure)

Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

Arts, K., Vandalon, V., Puurunen, R. L., Utriainen, M., Gao, F., Erwin Kessels, W. M. M. & Knoops, H. C. M., 24 Apr 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 3, 5 p., 030908.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
5 Citations (Scopus)
11 Downloads (Pure)

ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

Kia, A. M., Haufe, N., Esmaeili, S., Mart, C., Utriainen, M., Puurunen, R. L. & Weinreich, W., Jul 2019, In : Nanomaterials. 9, 7, 14 p., 1035.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
5 Citations (Scopus)
141 Downloads (Pure)
2018

Aqueous-phase reforming of Fischer-Tropsch alcohols over nickel-based catalysts to produce hydrogen: Product distribution and reaction pathways

Coronado, I., Pitínová, M., Karinen, R., Reinikainen, M., Puurunen, R. L. & Lehtonen, J., 25 Oct 2018, In : Applied Catalysis A: General. 567, p. 112-121 10 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
10 Citations (Scopus)
51 Downloads (Pure)

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Sippola, P., Pyymaki Perros, A., Ylivaara, O. M. E., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 1 Sep 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 051508.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
1 Citation (Scopus)
84 Downloads (Pure)

Learnings from an open science effort: Virtual project on the history of ALD

Puurunen, R. L., 1 Jan 2018, ATOMIC LAYER DEPOSITION APPLICATIONS. De Gendt, S., Elam, J. W., Dendooven, J., Van Der Straten, O., Roozeboom, F., Liu, C. & Illiberi, A. (eds.). Electrochemical Society, Inc., Vol. 14. p. 3-17 15 p. (ECS Transactions; vol. 86, no. 6).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

1 Citation (Scopus)

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
12 Citations (Scopus)
148 Downloads (Pure)
Open Access
File
3 Citations (Scopus)
5 Downloads (Pure)

Study of Ni, Pt, and Ru Catalysts on Wood-based Activated Carbon Supports and their Activity in Furfural Conversion to 2-Methylfuran

Mäkelä, E., Lahti, R., Jaatinen, S., Romar, H., Hu, T., Puurunen, R. L., Lassi, U. & Karinen, R., 2018, In : ChemCatChem. 10, 15, p. 3269-3283

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
10 Citations (Scopus)
111 Downloads (Pure)

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M., Sajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 13 p., 01A122.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
4 Citations (Scopus)
140 Downloads (Pure)
2017

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S. P., Ronkainen, H. & Puurunen, R., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 01B105.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
13 Citations (Scopus)
238 Downloads (Pure)

Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures

Puurunen, R. L. & Gao, F., 24 Mar 2017, 2016 14th International Baltic Conference on Atomic Layer Deposition, BALD 2016 - Proceedings. IEEE, p. 20-24 5 p. 7886526

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

8 Citations (Scopus)

Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., Kanervo, J. & 42 others, Khmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kärkkänen, I., Kääriäinen, M. L., Kääriäinen, T., Lamagna, L., Łapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Törndahl, T., Van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 010801.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
File
32 Citations (Scopus)
905 Downloads (Pure)
2016

Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 1 Jan 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 1, p. 1-11 11 p., 01A124.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
13 Citations (Scopus)
117 Downloads (Pure)

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

Mattinen, M., Hämäläinen, J., Gao, F., Jalkanen, P., Mizohata, K., Räisänen, J., Puurunen, R. L., Ritala, M. & Leskelä, M., 18 Oct 2016, In : Langmuir. 32, 41, p. 10559-10569 11 p.

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)

Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition

Ali, S., Juntunen, T., Sintonen, S., Ylivaara, O. M. E., Puurunen, R., Lipsanen, H., Tittonen, I. & Hannula, S. P., 27 Sep 2016, In : Nanotechnology. 27, 44, 445704.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)
2015

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Berdova, M., Ylivaara, O. M. E., Rontu, V., Törmä, P. T., Puurunen, R. & Franssila, S., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
9 Citations (Scopus)
332 Downloads (Pure)

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Gao, F., Arpiainen, S. & Puurunen, R. L., 1 Jan 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 010601.

Research output: Contribution to journalArticleScientificpeer-review

26 Citations (Scopus)
2014

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S-P. & Puurunen, R. L., 3 Feb 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journalArticleScientificpeer-review

93 Citations (Scopus)

A short history of atomic layer deposition: Tuomo Suntola's atomic layer epitaxy

Puurunen, R. L., 1 Dec 2014, In : Chemical Vapor Deposition. 20, 10-12, p. 332-344 13 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

Open Access
80 Citations (Scopus)

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Liu, X., Haimi, E., Hannula, S-P., Ylivaara, O. M. E. & Puurunen, R. L., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-6 6 p., 01A116.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
4 Citations (Scopus)
132 Downloads (Pure)

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X., Haimi, E., Hannula, S-P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2 May 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

Research output: Contribution to journalArticleScientificpeer-review

34 Citations (Scopus)

X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-4 4 p., 01A111.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
File
17 Citations (Scopus)
19 Downloads (Pure)
2013

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Miikkulainen, V., Leskelä, M., Ritala, M. & Puurunen, R. L., 14 Jan 2013, In : Journal of Applied Physics. 113, 2, 021301.

Research output: Contribution to journalReview ArticleScientificpeer-review

809 Citations (Scopus)
2012

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

Puurunen, R. L., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 240-245 6 p.

Research output: Contribution to journalArticleScientificpeer-review

11 Citations (Scopus)

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

Research output: Contribution to journalArticleScientificpeer-review

14 Citations (Scopus)

Use of ALD thin film bragg mirror stacks in tuneable visible light mems fabry-perot interferometers

Rissanen, A. & Puurunen, R. L., 2012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V. Vol. 8249. 82491A

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

8 Citations (Scopus)
2011

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

Puurunen, R. L., Sajavaara, T., Santala, E., Miikkulainen, V., Saukkonen, T., Laitinen, M. & Leskelä, M., 2011, In : Journal of Nanoscience and Nanotechnology. 11, 9, p. 8101-8107

Research output: Contribution to journalArticleScientificpeer-review

33 Citations (Scopus)

Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

Laitinen, M., Sajavaara, T., Rossi, M., Julin, J., Puurunen, R. L., Suni, T., Ishida, T., Fujita, H., Arstila, K., Brijs, B. & Whitlow, H. J., 15 Dec 2011, In : NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 269, 24, p. 3021-3024 4 p.

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

Puurunen, R. L., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 2011, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. p. 978-981 4 p. 5969474

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

5 Citations (Scopus)
2010

Atomic Layer Deposition in MEMS Technology

Puurunen, R. L., Kattelus, H. & Suntola, T., 2010, Handbook of Silicon Based MEMS Materials and Technologies. p. 433-446 14 p.

Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

18 Citations (Scopus)

Bonding of ALD alumina for advanced SOI substrates

Suni, T., Puurunen, R. L., Ylivaara, O., Kattelus, H., Henttinen, K., Ishida, T. & Fujita, H., 2010, Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gosele. 4 ed. Vol. 33. p. 137-144 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

7 Citations (Scopus)

Low-temperature processes for MEMS device fabrication

Kiihamäki, J., Kattelus, H., Blomberg, M., Puurunen, R., Laamanen, M., Pekko, P., Saarilahti, J., Ritala, H. & Rissanen, A., 2010, Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators. p. 167-178 12 p. (NATO Science for Peace and Security Series B: Physics and Biophysics).

Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

6 Citations (Scopus)

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

Laamanen, M., Blomberg, M., Puurunen, R. L., Miranto, A. & Kattelus, H., Aug 2010, In : Sensors and Actuators A: Physical. 162, 2, p. 210-214 5 p.

Research output: Contribution to journalArticleScientificpeer-review

6 Citations (Scopus)

Vapor-phase self-assembled monolayers for improved MEMS reliability

Rissanen, A., Tappura, K., Laamanen, M., Puurunen, R., Färm, E., Ritala, M. & Leskelä, M., 2010, IEEE Sensors 2010 Conference, SENSORS 2010. p. 767-770 4 p. 5690769

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

4 Citations (Scopus)
2007

Atomic layer deposition of iridium(III) acetylacetonate on alumina, silica-alumina, and silica supports

Silvennoinen, R., Jylhä, O., Lindblad, M., Sainio, J., Puurunen, R. & Krause, O., 2007, In : Applied Surface Science. 253, 9, p. 4103-4111

Research output: Contribution to journalArticleScientificpeer-review

27 Citations (Scopus)

Implementing ALD layers in MEMS processing

Puurunen, R. L., Saarilahti, J. & Kattelus, H., 2007, ECS Transactions - 3rd Symposium on Atomic Layer Deposition Applications. 7 ed. Vol. 11. p. 3-14 12 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

64 Citations (Scopus)
2006

Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition

Dekker, J., Kolari, K. & Puurunen, R. L., 2006, In : Journal of Vacuum Science and Technology. Part B.. 24, 5, p. 2350-2355 6 p.

Research output: Contribution to journalArticleScientificpeer-review

36 Citations (Scopus)

Nucleation of atomic-layer-deposited HfO 2 films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation

Green, M. L., Allen, A. J., Li, X., Wang, J., Ilavsky, J., Delabie, A., Puurunen, R. L. & Brijs, B., 2006, In : Applied Physics Letters. 88, 3, p. 1-3 3 p., 032907.

Research output: Contribution to journalArticleScientificpeer-review

13 Citations (Scopus)
2005

Atomic layer deposition of hafnium oxide on germanium substrates

Delabie, A., Puurunen, R. L., Brijs, B., Caymax, M., Conard, T., Onsia, B., Richard, O., Vandervorst, W., Zhao, C., Heyns, M. M., Meuris, M., Viitanen, M. M., Brongersma, H. H., De Ridder, M., Goncharova, L. V., Garfunkel, E., Gustafsson, T. & Tsai, W., 2005, In : Journal of Applied Physics. 97, 6, 064104.

Research output: Contribution to journalArticleScientificpeer-review

93 Citations (Scopus)
65 Citations (Scopus)

Erratum: Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))

Puurunen, R. L., May 2005, In : Chemical Vapor Deposition. 11, 5, p. 234 1 p.

Research output: Contribution to journalComment/debateScientificpeer-review

Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides: A review

Puurunen, R. L., Feb 2005, In : Chemical Vapor Deposition. 11, 2, p. 79-90 12 p.

Research output: Contribution to journalReview ArticleScientificpeer-review

61 Citations (Scopus)