Riikka Puurunen

Professor (Associate Professor)

Research outputs

  1. 2019
  2. Published

    Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study

    Voigt, P., Haimi, E., Lahtinen, J., Cheah, Y. W., Mäkelä, E., Viinikainen, T. & Puurunen, R. L., Aug 2019, In : Topics in Catalysis. 7–11, p. 611–620

    Research output: Contribution to journalArticleScientificpeer-review

  3. Published

    ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

    Kia, A. M., Haufe, N., Esmaeili, S., Mart, C., Utriainen, M., Puurunen, R. L. & Weinreich, W., Jul 2019, In : Nanomaterials. 9, 7, 14 p., 1035.

    Research output: Contribution to journalArticleScientificpeer-review

  4. Published

    Conformality in atomic layer deposition: Current status overview of analysis and modelling

    Cremers, V., Puurunen, R. L. & Dendooven, J., 1 Jun 2019, In : APPLIED PHYSICS REVIEWS. 6, 2, 021302.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  5. Published

    Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

    Arts, K., Vandalon, V., Puurunen, R. L., Utriainen, M., Gao, F., Erwin Kessels, W. M. M. & Knoops, H. C. M., 24 Apr 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 3, 5 p., 030908.

    Research output: Contribution to journalArticleScientificpeer-review

  6. Published

    Solvent-free Hydrodeoxygenation of γ-Nonalactone on Noble Metal Catalysts Supported on Zirconia

    González Escobedo, J. L., Mäkelä, E., Braunschweiler, A., Lehtonen, J., Lindblad, M., Puurunen, R. L. & Karinen, R., 1 Jan 2019, In : Topics in Catalysis.

    Research output: Contribution to journalArticleScientificpeer-review

  7. 2018
  8. Published

    Aqueous-phase reforming of Fischer-Tropsch alcohols over nickel-based catalysts to produce hydrogen: Product distribution and reaction pathways

    Coronado, I., Pitínová, M., Karinen, R., Reinikainen, M., Puurunen, R. L. & Lehtonen, J., 25 Oct 2018, In : Applied Catalysis A: General. 567, p. 112-121 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  9. Published

    Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

    Sippola, P., Pyymaki Perros, A., Ylivaara, O. M. E., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 1 Sep 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 051508.

    Research output: Contribution to journalArticleScientificpeer-review

  10. Published
  11. Published

    Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

    Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

    Research output: Contribution to journalArticleScientificpeer-review

  12. Published

    Learnings from an open science effort: Virtual project on the history of ALD

    Puurunen, R. L., 1 Jan 2018, ECS Transactions. De Gendt, S., Elam, J. W., Dendooven, J., Van Der Straten, O., Roozeboom, F., Liu, C. & Illiberi, A. (eds.). 6 ed. Electrochemical Society, Inc., Vol. 86. p. 3-17 15 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  13. Published

    Tribological properties of thin films made by atomic layer deposition sliding against silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M. & 5 othersSajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 13 p., 01A122.

    Research output: Contribution to journalArticleScientificpeer-review

  14. Published

    Study of Ni, Pt, and Ru Catalysts on Wood-based Activated Carbon Supports and their Activity in Furfural Conversion to 2-Methylfuran

    Mäkelä, E., Lahti, R., Jaatinen, S., Romar, H., Hu, T., Puurunen, R. L., Lassi, U. & Karinen, R., 2018, In : ChemCatChem. 10, 15, p. 3269-3283

    Research output: Contribution to journalArticleScientificpeer-review

  15. 2017
  16. Published

    Influence of ALD temperature on thin film conformality: Investigation with microscopic lateral high-aspect-ratio structures

    Puurunen, R. L. & Gao, F., 24 Mar 2017, 2016 14th International Baltic Conference on Atomic Layer Deposition, BALD 2016 - Proceedings. Institute of Electrical and Electronics Engineers, p. 20-24 5 p. 7886526

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  17. Published

    Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

    Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H. & 3 othersHannula, S. P., Ronkainen, H. & Puurunen, R., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 01B105.

    Research output: Contribution to journalArticleScientificpeer-review

  18. Published

    Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

    Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V. & 52 othersDevi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., Kanervo, J., Khmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kärkkänen, I., Kääriäinen, M. L., Kääriäinen, T., Lamagna, L., Łapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Törndahl, T., Van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 010801.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  19. 2016
  20. Published

    Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

    Mattinen, M., Hämäläinen, J., Gao, F., Jalkanen, P., Mizohata, K., Räisänen, J., Puurunen, R. L., Ritala, M. & Leskelä, M., 18 Oct 2016, In : Langmuir. 32, 41, p. 10559-10569 11 p.

    Research output: Contribution to journalArticleScientificpeer-review

  21. Published

    Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition

    Ali, S., Juntunen, T., Sintonen, S., Ylivaara, O. M. E., Puurunen, R., Lipsanen, H., Tittonen, I. & Hannula, S. P., 27 Sep 2016, In : Nanotechnology. 27, 44, 445704.

    Research output: Contribution to journalArticleScientificpeer-review

  22. Published

    Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 1 Jan 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 1, p. 1-11 11 p., 01A124.

    Research output: Contribution to journalArticleScientificpeer-review

  23. 2015
  24. Published

    Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

    Gao, F., Arpiainen, S. & Puurunen, R. L., 1 Jan 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 010601.

    Research output: Contribution to journalArticleScientificpeer-review

  25. Published

    Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

    Berdova, M., Ylivaara, O. M. E., Rontu, V., Törmä, P. T., Puurunen, R. & Franssila, S., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  26. 2014
  27. Published

    A short history of atomic layer deposition: Tuomo Suntola's atomic layer epitaxy

    Puurunen, R. L., 1 Dec 2014, In : Chemical Vapor Deposition. 20, 10-12, p. 332-344 13 p.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  28. Published

    Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

    Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X. & 6 othersHaimi, E., Hannula, S-P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2 May 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  29. Published

    Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

    Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M. & 7 othersHaimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S-P. & Puurunen, R. L., 3 Feb 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

    Research output: Contribution to journalArticleScientificpeer-review

  30. Published

    On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

    Liu, X., Haimi, E., Hannula, S-P., Ylivaara, O. M. E. & Puurunen, R. L., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-6 6 p., 01A116.

    Research output: Contribution to journalArticleScientificpeer-review

  31. Published

    X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

    Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-4 4 p., 01A111.

    Research output: Contribution to journalArticleScientificpeer-review

  32. 2013
  33. Published

    Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

    Miikkulainen, V., Leskelä, M., Ritala, M. & Puurunen, R. L., 14 Jan 2013, In : Journal of Applied Physics. 113, 2, 021301.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  34. 2012
  35. Published

    Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

    Puurunen, R. L., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & 1 othersKattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 240-245 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  36. Published

    Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

    Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

    Research output: Contribution to journalArticleScientificpeer-review

  37. Published

    Use of ALD thin film bragg mirror stacks in tuneable visible light mems fabry-perot interferometers

    Rissanen, A. & Puurunen, R. L., 2012, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V. Vol. 8249. 82491A

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  38. 2011
  39. Published

    Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

    Laitinen, M., Sajavaara, T., Rossi, M., Julin, J., Puurunen, R. L., Suni, T., Ishida, T., Fujita, H., Arstila, K., Brijs, B. & 1 othersWhitlow, H. J., 15 Dec 2011, In : NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 269, 24, p. 3021-3024 4 p.

    Research output: Contribution to journalArticleScientificpeer-review

  40. Published

    Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

    Puurunen, R. L., Sajavaara, T., Santala, E., Miikkulainen, V., Saukkonen, T., Laitinen, M. & Leskelä, M., 2011, In : Journal of Nanoscience and Nanotechnology. 11, 9, p. 8101-8107

    Research output: Contribution to journalArticleScientificpeer-review

  41. Published

    Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

    Puurunen, R. L., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 2011, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. p. 978-981 4 p. 5969474

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  42. 2010
  43. Published

    Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

    Laamanen, M., Blomberg, M., Puurunen, R. L., Miranto, A. & Kattelus, H., Aug 2010, In : Sensors and Actuators A: Physical. 162, 2, p. 210-214 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  44. Published

    Atomic Layer Deposition in MEMS Technology

    Puurunen, R. L., Kattelus, H. & Suntola, T., 2010, Handbook of Silicon Based MEMS Materials and Technologies. p. 433-446 14 p.

    Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

  45. Published

    Bonding of ALD alumina for advanced SOI substrates

    Suni, T., Puurunen, R. L., Ylivaara, O., Kattelus, H., Henttinen, K., Ishida, T. & Fujita, H., 2010, Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gosele. 4 ed. Vol. 33. p. 137-144 8 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  46. Published

    Low-temperature processes for MEMS device fabrication

    Kiihamäki, J., Kattelus, H., Blomberg, M., Puurunen, R., Laamanen, M., Pekko, P., Saarilahti, J., Ritala, H. & Rissanen, A., 2010, Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators. p. 167-178 12 p. (NATO Science for Peace and Security Series B: Physics and Biophysics).

    Research output: Chapter in Book/Report/Conference proceedingChapterScientificpeer-review

  47. Published

    Vapor-phase self-assembled monolayers for improved MEMS reliability

    Rissanen, A., Tappura, K., Laamanen, M., Puurunen, R., Färm, E., Ritala, M. & Leskelä, M., 2010, IEEE Sensors 2010 Conference, SENSORS 2010. p. 767-770 4 p. 5690769

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  48. 2007
  49. Published

    Atomic layer deposition of iridium(III) acetylacetonate on alumina, silica-alumina, and silica supports

    Silvennoinen, R., Jylhä, O., Lindblad, M., Sainio, J., Puurunen, R. & Krause, O., 2007, In : Applied Surface Science. 253, 9, p. 4103-4111

    Research output: Contribution to journalArticleScientificpeer-review

  50. Published

    Implementing ALD layers in MEMS processing

    Puurunen, R. L., Saarilahti, J. & Kattelus, H., 2007, ECS Transactions - 3rd Symposium on Atomic Layer Deposition Applications. 7 ed. Vol. 11. p. 3-14 12 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  51. 2006
  52. Published

    Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition

    Dekker, J., Kolari, K. & Puurunen, R. L., 2006, In : Journal of Vacuum Science and Technology. Part B.. 24, 5, p. 2350-2355 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  53. Published

    Nucleation of atomic-layer-deposited HfO 2 films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation

    Green, M. L., Allen, A. J., Li, X., Wang, J., Ilavsky, J., Delabie, A., Puurunen, R. L. & Brijs, B., 2006, In : Applied Physics Letters. 88, 3, p. 1-3 3 p., 032907.

    Research output: Contribution to journalArticleScientificpeer-review

  54. 2005
  55. Published
  56. Published

    Grazing incidence-X-ray fluorescence spectrometry for the compositional analysis of nanometer-thin high-κ dielectric HfO2 layers

    Hellin, D., Delabie, A., Puurunen, R. L., Beaven, P., Conard, T., Brijs, B., De Gendt, S. & Vinckier, C., Jul 2005, In : ANALYTICAL SCIENCES. 21, 7, p. 845-850 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  57. Published
  58. Published

    Erratum: Random deposition as a growth mode in atomic layer deposition (Chemical Vapor Deposition (2004) 10 (159))

    Puurunen, R. L., May 2005, In : Chemical Vapor Deposition. 11, 5, p. 234 1 p.

    Research output: Contribution to journalComment/debateScientificpeer-review

  59. Published

    Hafnium oxide films by atomic layer deposition for high- κ gate dielectric applications: Analysis of the density of nanometer-thin films

    Puurunen, R. L., Delabie, A., Van Elshocht, S., Caymax, M., Green, M. L., Brijs, B., Richard, O., Bender, H., Conard, T., Hoflijk, I. & 6 othersVandervorst, W., Hellin, D., Vanhaeren, D., Zhao, C., De Gendt, S. & Heyns, M., 14 Feb 2005, In : Applied Physics Letters. 86, 7, p. 1-3 3 p., 073116.

    Research output: Contribution to journalArticleScientificpeer-review

  60. Published

    Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides: A review

    Puurunen, R. L., Feb 2005, In : Chemical Vapor Deposition. 11, 2, p. 79-90 12 p.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  61. Published

    The future of high-K on pure germanium and its importance for Ge CMOS

    Meuris, M., Delabie, A., Van Elshocht, S., Kubicek, S., Verheyen, P., De Jaeger, B., Van Steenbergen, J., Winderickx, G., Van Moorhem, E., Puurunen, R. L. & 17 othersBrijs, B., Caymax, M., Conard, T., Richard, O., Vandervorst, W., Zhao, C., De Gendt, S., Schram, T., Chiarella, T., Onsia, B., Teerlinck, I., Houssa, M., Mertens, P. W., Raskin, G., Mijlemans, P., Biesemans, S. & Heyns, M. M., Feb 2005, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 8, 1-3, p. 203-207 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  62. Published

    Atomic layer deposition of hafnium oxide on germanium substrates

    Delabie, A., Puurunen, R. L., Brijs, B., Caymax, M., Conard, T., Onsia, B., Richard, O., Vandervorst, W., Zhao, C., Heyns, M. M. & 8 othersMeuris, M., Viitanen, M. M., Brongersma, H. H., De Ridder, M., Goncharova, L. V., Garfunkel, E., Gustafsson, T. & Tsai, W., 2005, In : Journal of Applied Physics. 97, 6, 064104.

    Research output: Contribution to journalArticleScientificpeer-review

  63. Published

    Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

    Puurunen, R. L., 2005, In : Journal of Applied Physics. 97, 12, p. 1-52 121301.

    Research output: Contribution to journalArticleScientificpeer-review

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