Oili Ylivaara

Research outputs

  1. 2019
  2. Published

    Microelectrode Array With Transparent ALD TiN Electrodes

    Ryynanen, T., Pelkonen, A., Grigoras, K., Ylivaara, O. M. E., Hyvarinen, T., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 22 Mar 2019, In : Frontiers in Neuroscience. 13, 7 p., 226.

    Research output: Contribution to journalArticleScientificpeer-review

  3. Published

    Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO 2 Using Carbon Dioxide

    Zhu, Z., Sippola, P., Ylivaara, O. M. E., Modanese, C., Di Sabatino, M., Mizohata, K., Merdes, S., Lipsanen, H. & Savin, H., 12 Feb 2019, In : Nanoscale Research Letters. 14, 8 p., 55.

    Research output: Contribution to journalArticleScientificpeer-review

  4. 2018
  5. Published

    Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

    Sippola, P., Pyymaki Perros, A., Ylivaara, O. M. E., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 1 Sep 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 051508.

    Research output: Contribution to journalArticleScientificpeer-review

  6. Published

    Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

    Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

    Research output: Contribution to journalArticleScientificpeer-review

  7. Published

    Tribological properties of thin films made by atomic layer deposition sliding against silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M. & 5 othersSajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 13 p., 01A122.

    Research output: Contribution to journalArticleScientificpeer-review

  8. 2017
  9. Published

    Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

    Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H. & 3 othersHannula, S. P., Ronkainen, H. & Puurunen, R., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 01B105.

    Research output: Contribution to journalArticleScientificpeer-review

  10. Published

    Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

    Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V. & 52 othersDevi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., Kanervo, J., Khmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kärkkänen, I., Kääriäinen, M. L., Kääriäinen, T., Lamagna, L., Łapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Törndahl, T., Van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 010801.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  11. 2016
  12. Published

    Thermal conductivity of amorphous Al2O3/TiO2 nanolaminates deposited by atomic layer deposition

    Ali, S., Juntunen, T., Sintonen, S., Ylivaara, O. M. E., Puurunen, R., Lipsanen, H., Tittonen, I. & Hannula, S. P., 27 Sep 2016, In : Nanotechnology. 27, 44, 445704.

    Research output: Contribution to journalArticleScientificpeer-review

  13. Published

    Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 1 Jan 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 1, p. 1-11 11 p., 01A124.

    Research output: Contribution to journalArticleScientificpeer-review

  14. 2015
  15. Published

    Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

    Lyytinen, J., Liu, X., Ylivaara, O. M. E., Sintonen, S., Iyer, A., Ali, S., Julin, J., Lipsanen, H., Sajavaara, T., Puurunen, R. L. & 1 othersKoskinen, J., 15 Nov 2015, In : Wear. 342-343, p. 270-278 9 p.

    Research output: Contribution to journalArticleScientificpeer-review

  16. Published

    Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

    Berdova, M., Ylivaara, O. M. E., Rontu, V., Törmä, P. T., Puurunen, R. & Franssila, S., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  17. 2014
  18. Published

    Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

    Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X. & 6 othersHaimi, E., Hannula, S-P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2 May 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  19. Published

    Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

    Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M. & 7 othersHaimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S-P. & Puurunen, R. L., 3 Feb 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

    Research output: Contribution to journalArticleScientificpeer-review

  20. Published

    On the Early History of ALD: Molecular Layering

    Aarik, J., Akbashev, A. R., Cameron, D., Elam, J., Elliott, S., Gottardi, G., Grigoras, K., Koshtyal, Y., Kääriäinen, M-L., Kääriäinen, T. & 13 othersMalkov, A., Malygin, A., Molarius, J., Nikkola, J., Pedersen, H., Puurunen, R. L., Ras, R. H. A., Roozeboom, F., Savin, H., Seidel, T. E., Sundqvist, J., van Ommen, J. R. & Ylivaara, O., 2014, 14th International Conference on Atomic Layer Deposition, Kyoto, Japan, June 15-18, 2014.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  21. Published

    On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

    Liu, X., Haimi, E., Hannula, S-P., Ylivaara, O. M. E. & Puurunen, R. L., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-6 6 p., 01A116.

    Research output: Contribution to journalArticleScientificpeer-review

  22. Published

    Overview of early publications on Atomic Layer Deposition

    Aarik, J., Akbashev, A. R., Cameron, D., Elam, J., Elliott, S., Gottardi, G., Grigoras, K., Koshtyal, Y., Kääriäinen, M-L., Kääriäinen, T. & 13 othersMalkov, A., Malygin, A., Molarius, J., Nikkola, J., Pedersen, H., Puurunen, R. L., Ras, R. H. A., Roozeboom, F., Savin, H., Seidel, T. E., Sundqvist, J., van Ommen, J. R. & Ylivaara, O. M. E., 2014.

    Research output: Working paperProfessional

  23. Published

    Overview of early publications on Atomic Layer Deposition

    Aarik, J., Akbashev, A. R., Cameron, D., Elam, J., Elliott, S., Gottardi, G., Grigoras, K., Koshtyal, Y., Kääriäinen, M-L., Kääriäinen, T. & 13 othersMalkov, A., Malygin, A., Molarius, J., Nikkola, J., Pedersen, H., Puurunen, R. L., Ras, R. H. A., Roozeboom, F., Savin, H., Seidel, T. E., Sundqvist, J., van Ommen, J. R. & Ylivaara, O. M. E., 2014, 14th International Conference on Atomic Layer Deposition, Kyoto, Japan, June 15-18, 2014.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  24. Published

    X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

    Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-4 4 p., 01A111.

    Research output: Contribution to journalArticleScientificpeer-review

  25. 2012
  26. Published

    Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

    Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., Dec 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

    Research output: Contribution to journalArticleScientificpeer-review

  27. 2011
  28. Published

    Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

    Puurunen, R. L., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 2011, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. p. 978-981 4 p. 5969474

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  29. 2010
  30. Published

    Bonding of ALD alumina for advanced SOI substrates

    Suni, T., Puurunen, R. L., Ylivaara, O., Kattelus, H., Henttinen, K., Ishida, T. & Fujita, H., 2010, Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gosele. 4 ed. Vol. 33. p. 137-144 8 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

ID: 5351025