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Personal profile

Education/Academic qualification

Master of Science (Technology), Materials Technology

Fingerprint Dive into the research topics where Oili Ylivaara is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

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Research Output

  • 17 Article
  • 5 Conference contribution
  • 1 Review Article
  • 1 Working paper

Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkila, M. J. & Savin, H., 30 Sep 2019, In : PHYSICA STATUS SOLIDI A: APPLICATIONS AND MATERIALS SCIENCE. 5 p., 1900237.

Research output: Contribution to journalArticleScientificpeer-review

Intercalation of Lithium Ions from Gaseous Precursors into β-MnO2 Thin Films Deposited by Atomic Layer Deposition

Nieminen, H. E., Miikkulainen, V., Settipani, D., Simonelli, L., Hönicke, P., Zech, C., Kayser, Y., Beckhoff, B., Honkanen, A. P., Heikkilä, M. J., Mizohata, K., Meinander, K., Ylivaara, O. M. E., Huotari, S. & Ritala, M., 27 Jun 2019, In : Journal of Physical Chemistry C. 123, 25, p. 15802-15814 13 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
  • 2 Citations (Scopus)

    Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO 2 Using Carbon Dioxide

    Zhu, Z., Sippola, P., Ylivaara, O. M. E., Modanese, C., Di Sabatino, M., Mizohata, K., Merdes, S., Lipsanen, H. & Savin, H., 12 Feb 2019, In : Nanoscale Research Letters. 14, 8 p., 55.

    Research output: Contribution to journalArticleScientificpeer-review

    Open Access
    File
  • 1 Citation (Scopus)
    137 Downloads (Pure)

    Microelectrode Array With Transparent ALD TiN Electrodes

    Ryynanen, T., Pelkonen, A., Grigoras, K., Ylivaara, O. M. E., Hyvarinen, T., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 22 Mar 2019, In : Frontiers in Neuroscience. 13, 7 p., 226.

    Research output: Contribution to journalArticleScientificpeer-review

    Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

    Sippola, P., Pyymaki Perros, A., Ylivaara, O. M. E., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 1 Sep 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 051508.

    Research output: Contribution to journalArticleScientificpeer-review

    Open Access
    File
  • 1 Citation (Scopus)
    84 Downloads (Pure)