Engineering
Conformality
100%
Atomic Layer Deposition
100%
Simulation
58%
Thickness
50%
Process Parameter
50%
Microchannel
50%
Reaction Model
50%
Models
36%
Coverage
30%
Thin Film Growth
25%
Reactant
25%
High Aspect Ratio
20%
Cycles
16%
Molar Mass
16%
Diffusion
16%
Coating
10%
Absolute Value
10%
Surface Coverage
10%
Applications
8%
Density
8%
Temperature
8%
Deposition Process
8%
Exposure Time
8%
Partial Pressure
8%
Chemistry
Atomic Layer Epitaxy
100%
Chemical Reaction
66%
Procedure
50%
Thickness
50%
Reaction-Diffusion System
50%
Slope
36%
Diffusion
25%
Liquid Film
18%
Pressure
16%
Molar Mass
16%
Pharmacokinetics
10%
Monte Carlo Method
10%
Surface
10%
Noble Gas Atom
8%
Time
8%
Partial Pressure
8%
Chemical Kinetics Characteristics
8%
Gas
8%
Simulation
8%
Deposition Process
8%
Solid
8%
Density
8%
Molecule
8%
Reaction Temperature
8%
Particle Size
8%
Application
8%
Earth and Planetary Sciences
Comparison
50%
Atomic Layer Epitaxy
50%
Ballistics
50%
Diffusion
50%
Model
50%
Simulation
50%
Growth
50%
Penetration
18%
Slope
9%
Value
9%
Adsorption
9%
