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Atomic layer deposition of highly doped Er:Al2O3 and Tm:Al2O3 for silicon-based waveguide amplifiers

Rönn, J., Karvonen, L., Pyymaki-Perros, A., Peyghambarian, N. N., Lipsanen, H., Säynätjoki, A. & Sun, Z., 2016, p. 98910Y. 1 p.

Research output: Contribution to conferencePaperScientific