MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Research outputs

  1. 2019
  2. Published

    Compatibility of 3-D Printed Devices in Cleanroom Environments for Semiconductor Processing

    Pasanen, T. P., von Gastrow, G., Heikkinen, I. T. S., Vähänissi, V., Savin, H. & Pearce, J., 1 Jan 2019, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 89, p. 59-67 9 p.

    Research output: Contribution to journalArticleScientificpeer-review

  3. 2017
  4. Published

    Formation of Zn- and O- vacancy clusters in ZnO through deuterium annealing

    Johansen, K. M., Tuomisto, F., Makkonen, I. & Vines, L., Oct 2017, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 69, p. 23-27 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  5. Published

    Subsurface damage in polishing-annealing processed ZnO substrates

    Prozheeva, V., Johansen, K. M., Neuvonen, P. T., Zubiaga, A., Vines, L., Kuznetzov, A. Y. & Tuomisto, F., Oct 2017, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 69, p. 19-22

    Research output: Contribution to journalArticleScientificpeer-review

  6. Published

    Selective photoelectrochemical deposition of polypyrrole onto hydrogenated a-Si for optoelectronic applications

    Dosenovicova, D., Maricheva, J., Neumüller, A., Sergeev, O., Volobujeva, O., Nasibulin, A. G., Kois, J., Öpik, A. & Bereznev, S., 2017, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 68, p. 1-5 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  7. 2012
  8. Published

    Advances in positron annihilation spectroscopy of Si, Ge and their alloys

    Slotte, J. & Tuomisto, F., Dec 2012, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 15, 6, p. 669-674 6 p.

    Research output: Contribution to journalReview ArticleScientificpeer-review

  9. 2006
  10. Published

    Modeling the silicon-hafnia interface

    Nieminen, R. M., Hakala, M. H. & Foster, A. S., Dec 2006, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 9, 6, p. 928-933 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  11. Published

    The effect of compressive biaxial stress on vacancy clustering in thin Si-Ge layers

    Ganchenkova, M. G. & Borodin, V. A., 2006, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 9, 4-5, p. 507-513

    Research output: Contribution to journalArticleScientificpeer-review

  12. 2005
  13. Published

    The future of high-K on pure germanium and its importance for Ge CMOS

    Meuris, M., Delabie, A., Van Elshocht, S., Kubicek, S., Verheyen, P., De Jaeger, B., Van Steenbergen, J., Winderickx, G., Van Moorhem, E., Puurunen, R. L. & 17 others, Brijs, B., Caymax, M., Conard, T., Richard, O., Vandervorst, W., Zhao, C., De Gendt, S., Schram, T., Chiarella, T., Onsia, B., Teerlinck, I., Houssa, M., Mertens, P. W., Raskin, G., Mijlemans, P., Biesemans, S. & Heyns, M. M., Feb 2005, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 8, 1-3, p. 203-207 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  14. 2004
  15. Published

    Analyses of interfacial reactions at different levels of interconnection

    Laurila, T., Vuorinen, V. & Kivilahti, J. K., 2004, In : MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. 7, 4-6 SPEC. ISS., p. 307-317 11 p.

    Research output: Contribution to journalArticleScientificpeer-review

ID: 334991