JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

Research outputs

  1. 2019
  2. Published

    Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors

    Miikkulainen, V., Väyrynen, K., Mizohata, K., Räisänen, J., Vehkamäki, M. & Ritala, M., 1 Nov 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 6, 060911.

    Research output: Contribution to journalArticle

  3. Published

    Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

    Arts, K., Vandalon, V., Puurunen, R. L., Utriainen, M., Gao, F., Erwin Kessels, W. M. M. & Knoops, H. C. M., 24 Apr 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 37, 3, 5 p., 030908.

    Research output: Contribution to journalArticle

  4. Published
  5. Published

    Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia

    Mäntymäki, M., Atosuo, E., Heikkilä, M., Vehkamäki, M., Mattinen, M., Mizohata, K., Räisänen, J., Ritala, M. & Leskelä, M., 1 Mar 2019, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 37, 2, p. 020929 8 p., 020929.

    Research output: Contribution to journalArticle

  6. 2018
  7. Published
  8. Published
  9. Published

    Tribological properties of thin films made by atomic layer deposition sliding against silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M. & 5 others, Sajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 13 p., 01A122.

    Research output: Contribution to journalArticle

  10. Published

    Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

    Rontu, V., Sippola, P., Broas, M., Ross, G., Lipsanen, H., Paulasto-Kröckel, M. & Franssila, S., Jan 2018, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 36, 2, 021508.

    Research output: Contribution to journalArticle

  11. 2017
  12. Published

    Atomic layer etching of gallium nitride (0001)

    Kauppinen, C., Khan, S. A., Sundqvist, J., Suyatin, D. B., Suihkonen, S., Kauppinen, E. I. & Sopanen, M., 1 Nov 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 6, p. 1-5 5 p., 060603.

    Research output: Contribution to journalArticle

  13. Published

    Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

    Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H. & 3 others, Hannula, S. P., Ronkainen, H. & Puurunen, R., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 01B105.

    Research output: Contribution to journalArticle

  14. Published

    Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD: Recommended reading list of early publications on atomic layer deposition - Outcome of the "Virtual Project on the History of ALD"

    Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V. & 52 others, Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., Kanervo, J., Khmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, A. O. I., Kuhs, J., Kärkkänen, I., Kääriäinen, M. L., Kääriäinen, T., Lamagna, L., Łapicki, A. A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R. L., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D. B., Törndahl, T., Van Ommen, J. R., Wiemer, C., Ylivaara, O. M. E. & Yurkevich, O., 1 Jan 2017, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 35, 1, p. 1-13 13 p., 010801.

    Research output: Contribution to journalReview Article

  15. 2016
  16. Published

    Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

    Berdova, M., Liu, X., Wiemer, C., Lamperti, A., Tallarida, G., Cianci, E., Fanciulli, M. & Franssila, S., 1 Sep 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 5, 051510.

    Research output: Contribution to journalArticle

  17. Published

    Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

    Broas, M., Sippola, P., Sajavaara, T., Vuorinen, V., Pyymaki Perros, A., Lipsanen, H. & Paulasto-Kröckel, M., 1 Jul 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 4, p. 1-10 10 p., 041506.

    Research output: Contribution to journalArticle

  18. Published

    Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

    Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 1 Jan 2016, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 34, 1, p. 1-11 11 p., 01A124.

    Research output: Contribution to journalArticle

  19. 2015
  20. Published

    Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

    Gao, F., Arpiainen, S. & Puurunen, R. L., 1 Jan 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 010601.

    Research output: Contribution to journalArticle

  21. Published

    Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

    Bao, Y., Li, S., von Gastrow, G., Repo, P., Putkonen, M. & Savin, H., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, 4 p., 01A123.

    Research output: Contribution to journalArticle

  22. Published
  23. Published

    Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO2 films

    Mann, H. S., Lang, B. N., Schwab, Y., Niemelä, J-P., Karppinen, M. & Scarel, G., 2015, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 33, 1, p. 1-7 01A124.

    Research output: Contribution to journalArticle

  24. 2014
  25. Published

    Adhesion Testing of Atomic Layer Deposited TiO2 on Glass Substrate by the Use of Embedded SiO2 Microspheres

    Lyytinen, J., Berdova, M., Franssila, S. & Koskinen, J., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-5 5 p., 01A102.

    Research output: Contribution to journalArticle

  26. Published

    Hybrid inorganic–organic superlattice structures with atomic layer deposition/molecular layer deposition

    Tynell, T., Yamauchi, H. & Karppinen, M., 2014, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 32, 1, p. 1-5 01A105.

    Research output: Contribution to journalArticle

  27. Published
  28. Published
  29. 2013
  30. Published

    Characterization of thin film adhesion by MEMS shaft-loading blister testing

    Berdova, M., Lyytinen, J., Grigoras, K., Baby, A., Kilpi, L., Ronkainen, H., Franssila, S. & Koskinen, J., 2013, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 31, 3, p. 1-5 5 p., 031102.

    Research output: Contribution to journalArticle

  31. 2012
  32. Published

    Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

    Kariniemi, M., Niinistö, J., Vehkamäki, M., Kemell, M., Ritala, M., Leskelä, M. & Putkonen, M., 2012, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 30, 00, p. 01

    Research output: Contribution to journalArticle

  33. Published

    Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF(6) based plasmas

    Perros, A., Bosund, M., Sajavaara, T., Laitinen, M., Sainiemi, L., Huhtio, T. & Lipsanen, H., 2012, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 30, 1, p. 1-5 5 p., 011504.

    Research output: Contribution to journalArticle

  34. 1999
  35. Published

    Pattern shape effects and artefacts in deep silicon etching

    Kiihamäki, J. & Franssila, S., 1999, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. A17, 4, p. 2280-2285

    Research output: Contribution to journalArticle

  36. 1990
  37. Published

ID: 322190