JOURNAL OF ADVANCED DIELECTRICS

Research outputs

  1. 2011
  2. Published

    ATOMIC LAYER DEPOSITION HfO2 FILM USED AS BUFFER LAYER OF THE Pt/(Bi0.95Nd0.05)(Fe0.95Mn0.05)O3/HfO2/Si CAPACITORS FOR FeFET APPLICATION

    Xie, D., Feng, T., Luo, Y., Han, X., Ren, T., Bosund, M., Li, S., Airaksinen, V-M., Lipsanen, H. & Honkanen, S., 2011, In : JOURNAL OF ADVANCED DIELECTRICS. 1, 3, p. 369-377

    Research output: Contribution to journalArticleScientificpeer-review

ID: 286196