Chemical Vapor Deposition

Research outputs

  1. 2014
  2. Published

    A short history of atomic layer deposition: Tuomo Suntola's atomic layer epitaxy

    Puurunen, R. L., 1 Dec 2014, In : Chemical Vapor Deposition. 20, 10-12, p. 332-344 13 p.

    Research output: Contribution to journalReview Article

  3. 2013
  4. Published

    Atomic layer deposition of LiF thin films from Lithd and TiF4 precursors

    Mäntymäki, M., Hämäläinen, J., Puukilainen, E., Munnik, F., Ritala, M. & Leskelä, M., 1 Jun 2013, In : Chemical Vapor Deposition. 19, 4-6, p. 111-116 6 p.

    Research output: Contribution to journalArticle

  5. 2012
  6. Published

    Atomic layer deposition of WO3 thin films using W(CO)6 and O3 precursors

    Malm, J., Sajavaara, T. & Karppinen, M., 2012, In : Chemical Vapor Deposition. 18, 7-9, p. 245-248

    Research output: Contribution to journalArticle

  7. 2006
  8. Published

    Aerosol catalyst particles for substrate CVD synthesis of single-walled carbon nanotubes

    Queipo, P., Nasibulin, A. G., Jiang, H., Gonzalez, D. & Kauppinen, E., 2006, In : Chemical Vapor Deposition. 12(6), p. 364-369

    Research output: Contribution to journalArticle

  9. 2005
  10. Published
  11. Published
  12. Published

    High growth rate of erbium oxide thin films in atomic layer deposition from tris(methylcyclopentadienyl)erbium and water precursors

    Päiväsaari, J., Niinistö, J., Arstila, K., Kukli, K., Putkonen, M. & Niinistö, L., 2005, In : Chemical Vapor Deposition. 11, 10, p. 415-419

    Research output: Contribution to journalArticle

  13. Published

    New approach to ALD of bismuth silicates; Bi(CH2SiMe3)3 acting as a precursor for both bismuth and silicon

    Harjuoja, J., Hatanpää, T., Vehkamäki, M., Väyrynen, S., Putkonen, M., Niinistö, L., Ritala, M., Leskelä, M. & Rauhala, E., 2005, In : Chemical Vapor Deposition. 11, p. 362-367

    Research output: Contribution to journalArticle

  14. 2004
  15. Published

    Random deposition as a growth mode in atomic layer deposition

    Puurunen, R. L., Jun 2004, In : Chemical Vapor Deposition. 10, 3, p. 159-170 12 p.

    Research output: Contribution to journalArticle

  16. 2003
  17. Published

    Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model

    Puurunen, R., 2003, In : Chemical Vapor Deposition. 9, 5, p. 249-257

    Research output: Contribution to journalArticle

  18. Published
  19. Published

    ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3))2 and Water as Precursors

    Putkonen, M., Niinistö, J., Kukli, K., Sajavaara, T., Karppinen, M., Yamauchi, H. & Niinistö, L., 2003, In : Chemical Vapor Deposition. 9, 4, p. 207-212

    Research output: Contribution to journalArticle

  20. 2001
  21. Published

    Low-temperature ALE deposition of Y_(2)O_3 thin films from beta-diketonate precursors

    Putkonen, M., Sajavaara, T., Johansson, L-S. & Niinistö, L., 2001, In : Chemical Vapor Deposition. 7, 1, p. 44-50

    Research output: Contribution to journalArticle

  22. Published

    Low-temperature ALE Deposition of Y2O3, Thin Films from beta-Diketonate Precursors

    Putkonen, M., Sajavaara, T., Johansson, L-S. & Niinistö, L., 2001, In : Chemical Vapor Deposition. 7, p. 44-50

    Research output: Contribution to journalArticle

  23. 1997
  24. Published

    Volatile metal ß-diketonates: ALE and CVD precursors for electroluminescent device thin films

    Tiitta, M. & Niinistö, L., 1997, In : Chemical Vapor Deposition. 3, 4, p. 167-182

    Research output: Contribution to journalArticle

  25. 1996
  26. Published

    Atomic layer epitaxy of strontium sulfide thin films using in situ synthesized strontium precursors

    Soininen, P., Nykänen, E., Niinistö, L. & Leskelä, M., 1996, In : Chemical Vapor Deposition. 2, p. 69-74

    Research output: Contribution to journalArticle

ID: 203547