OtaNano - Nanofab

Facility/equipment: Facility

  • Location

    Tietotie 3

    Micronova

    Espoo

    02150

    Finland

Equipments Details

Description

OtaNano – Nanofab is the largest micro and nano fabrication cleanroom in Northern Europe, with a total of 2600 m2 lab space for state-of-the-art research and technology development. It enables fabrication of micro and nano structures, quantum devices, microsystems and microfluidic chips, micro and nano sensors, photonics and optoelectronic devices. Also, small scale mass production and fabrication of prototypes is possible in Nanofab. The devices are available for individual use or as a service. Safety and basic user trainings are a requirement for equipment use. Courses are organised on demand.

Nanofab cleanroom and measurement laboratories enable several fabrication and measurement processes, mainly on silicon or quartz wafers. The cleanroom is divided to areas with cleanroom classification ranging from ISO4 to ISO6. Most of the areas belong to class ISO5. In addition to the main cleanroom there are laboratories with built-in cleanrooms for micropackaging and back-end processes as well as well-equipped and controlled labs for MOVPE and other thin film processes.

Fingerprint Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.

  • Research Output

    2D electrons and 2D plasmons in AlGaN/GaN nanostructure under highly non-equilibrium conditions

    Loginov, L. A., Shalygin, V. A., Moldavskaya, M. D., Vinnichenko, M. Y., Firsov, D. A., Maremyanin, K. V., Sakharov, A. V., Zavarin, E. E., Arteev, D. S., Lundin, W. V., Kauppinen, C. & Suihkonen, S., 25 Mar 2020, In : Journal of Physics: Conference Series. 1482, 1, 012022.

    Research output: Contribution to journalConference articleScientificpeer-review

    Open Access
    File
  • 5 Downloads (Pure)

    AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure

    Heikkinen, I. T. S., Koutsourakis, G., Virtanen, S., Yli-Koski, M., Wood, S., Vähänissi, V., Salmi, E., Castro, F. A. & Savin, H., Mar 2020, In : JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A. 38, 2, 022401.

    Research output: Contribution to journalArticleScientificpeer-review

    Open Access
    File
  • 39 Downloads (Pure)

    Atomic layer deposited aluminium oxide mitigates outgassing from fused filament fabrication–based 3-D printed components

    Heikkinen, I. T. S., Marin, G., Bihari, N., Ekstrum, C., Mayville, P. J., Fei, Y., Hu, Y. H., Karppinen, M., Savin, H. & Pearce, J. M., Feb 2020, In : Surface and Coatings Technology. 386, 24 p., 125459.

    Research output: Contribution to journalArticleScientificpeer-review

  • Activities

    • 11 Conference presentation
    • 4 Public or invited talk

    Proof of concept: ARC-free black interdigitated back contact module with wide acceptance angle

    Pablo Ortega (Contributor), Toni Pasanen (Speaker), Moises Garin (Contributor), Guillaume von Gastrow (Contributor), Tuukka Savisalo (Contributor), Antti Tolvanen (Contributor), Henri Vahlman (Contributor), Ville Vähänissi (Contributor), David Carrio (Contributor), Ramon Alcubilla (Contributor), Hele Savin (Contributor)
    6 Feb 2020

    Activity: Talk or presentation typesConference presentation

    Passivation of detector-grade Fz-Si with atomic layer deposited aluminium oxide

    Toni Pasanen (Speaker), Jennifer Ott (Contributor), Päivikki Repo (Contributor), Heli Seppänen (Contributor), Ville Vähänissi (Contributor), Hele Savin (Contributor)
    23 Sep 2019

    Activity: Talk or presentation typesConference presentation

    Doping in silicon affects the blistering of ALD-grown aluminium oxide

    Jennifer Ott (Speaker), Moises Garin (Contributor), Kawa Rosta (Contributor), Toni Pasanen (Contributor), Ville Vähänissi (Contributor), Hele Savin (Contributor)
    26 Sep 2019

    Activity: Talk or presentation typesConference presentation