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US Patent Issued to OMYA INTERNATIONAL on April 13 for "Method for manufacturing a water-insoluble pattern" (Swiss Inventors)

Press/Media: Media appearance

Period14 Apr 2021

Media coverage

1

Media coverage

  • TitleUS Patent Issued to OMYA INTERNATIONAL on April 13 for "Method for manufacturing a water-insoluble pattern" (Swiss Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date14/04/2021
    PersonsPatrick Gane