Effects of post oxidation of SiO2/Si interfaces in ultrahigh vacuum below 450 °C

Press/Media: Media appearance

Period	1 Jul 2022

Media coverage

Title	Effects of post oxidation of SiO2/Si interfaces in ultrahigh vacuum below 450 °C
Media name/outlet	Aaltodoc
Country/Territory	Finland
Date	01/07/2022
URL	https://aaltodoc.aalto.fi/handle/123456789/115525
Persons	Hele Savin