Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications–Effects of Precursor and Operating Conditions

Press/Media: Media appearance

Period	20 Sept 2023

Media coverage

Title	Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications–Effects of Precursor and Operating Conditions
Media name/outlet	Aaltodoc
Country/Territory	Finland
Date	20/09/2023
URL	ct.moreover.com/?a=51849205432&p=1gw&v=1&x=NPuT1w6ksVdUV3ujzcNiGQ
Persons	Hele Savin, Hanchen Liu