Efficient Surface Passivation of Black Silicon Using Spatial ALD

Heikkinen, I. T. S. (Contributor)
Repo, P. (Contributor)
Vähänissi, V. (Contributor)
Toni Pasanen (Contributor)
Ville Malinen (Contributor)
Emma Salmi (Speaker)
Savin, H. (Contributor)

Activity: Talk or presentation types › Conference presentation

Period	17 Jul 2017
Event title	International Conference on Atomic Layer Deposition
Event type	Conference
Conference number	17
Location	Denver, Colorado, United StatesShow on map
Degree of Recognition	International

Keywords

black silicon
spatial atomic layer deposition
surface passivation
aluminum oxide
nanostructured silicon

Related content

Infrastructure
OtaNano - Nanofab
Facility/equipment: Facility

Projects
Black silicon and defect engineering for highly efficient solar cells and modules, BLACK
Project: Business Finland: Other research funding