Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma as co-reactant

Activity: Talk or presentation typesConference presentation

Ville Rontu - Speaker

Perttu Sippola - Speaker

Mikael Broas - Speaker

Timo Sajavaara - Speaker

Mervi Paulasto-Kröckel - Speaker

Harri Lipsanen - Speaker

Sami Franssila - Speaker

15 Jul 201718 Jul 2017

Event (Conference)

TitleInternational Conference on Atomic Layer Deposition
Abbrev. TitleALD 2017
Period15/07/201718/07/2017
CityDenver, Colorado
CountryUnited States
Degree of recognitionInternational event

ID: 15859939