Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma as co-reactant
- Ville Rontu (Speaker)
- Perttu Sippola (Speaker)
- Mikael Broas (Speaker)
- Timo Sajavaara (Speaker)
- Paulasto-Kröckel, M. (Speaker)
- Lipsanen, H. (Speaker)
- Franssila, S. (Speaker)
Activity: Talk or presentation types › Conference presentation