Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma as co-reactant

Rontu, V. (Speaker), Perttu Sippola (Speaker), Mikael Broas (Speaker), Timo Sajavaara (Speaker), Paulasto-Kröckel, M. (Speaker), Lipsanen, H. (Speaker), Franssila, S. (Speaker)

Activity: Talk or presentation typesConference presentation

Period15 Jul 201718 Jul 2017
Event titleInternational Conference on Atomic Layer Deposition
Event typeConference
Conference number17
LocationDenver, Colorado, United States